Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study.
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A. Tünnermann | M. Sierka | K. Jandt | V. Beladiya | W. Kessels | A. Szeghalmi | T. Fritz | T. Faraz | M. Becker | M. Gruenewald | F. Otto | Christian Helbing | Paul Schenk