Hot-carrier degradation of p-MOSFET's under analog operation
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Karl Goser | Werner Weber | Roland Thewes | M. Brox | R. Thewes | W. Weber | K. Goser | M. Brox
[1] T. E. Kopley,et al. High-frequency AC hot-carrier degradation in CMOS circuits , 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.
[2] W. Weber,et al. Dynamic degradation in MOSFET's. I. The physical effects , 1991 .
[3] Q. Wang,et al. Explanation and model for the logarithmic time dependence of p-MOSFET degradation , 1991, IEEE Electron Device Letters.
[4] Robert G. Meyer,et al. An engineering model for short-channel MOS devices , 1988 .
[5] M. Koyanagi,et al. Hot-electron-induced punchthrough (HEIP) effect in submicrometer PMOSFET's , 1987, IEEE Transactions on Electron Devices.
[6] P. Heremans,et al. On the different time dependence of interface trap generation and charge thapping during hot carrier degradation in CMOS , 1992, ESSDERC '92: 22nd European Solid State Device Research conference.
[7] Q. Wang,et al. A model for the time- and bias-dependence of p-MOSFET degradation , 1994 .
[8] A. Hamada,et al. Time dependence of p-MOSFET hot-carrier degradation measured and interpreted consistently over ten orders of magnitude , 1993 .
[9] Chenming Hu,et al. The effects of hot-electron degradation on analog MOSFET performance , 1990, International Technical Digest on Electron Devices.
[10] R. Thewes,et al. Hot-carrier degradation of p-MOSFET's in analog operation: the relevance of the channel-length-independent drain conductance degradation , 1992, 1992 International Technical Digest on Electron Devices Meeting.
[11] R. Woltjer,et al. Modeling of oxide-charge generation during hot-carrier degradation of PMOSFET's , 1994 .
[12] Peng Fang,et al. Hot-carrier-reliability design rules for translating device degradation to CMOS digital circuit degradation , 1994 .
[13] A. Bravaix,et al. Lifetime prediction methods for p-MOSFET's: a comparative study of standard and charge-pumping lifetime criteria , 1995 .
[14] Differential capacitance technique for characterization of hot carrier induced degradation in p-channel MOSFETs , 1990, International Technical Digest on Electron Devices.
[15] R. Thewes,et al. Channel-length-independent hot-carrier degradation in analog p-MOS operation , 1992, IEEE Electron Device Letters.
[16] D. Schmitt-Landsiedel,et al. Dynamic degradation in MOSFET's. II. Application in the circuit environment , 1991 .
[17] Ping K. Ko,et al. Chapter 1 - Approaches to Scaling , 1989 .
[18] C.G. Sodini,et al. The effect of high fields on MOS device and circuit performance , 1984, IEEE Transactions on Electron Devices.
[19] H. Lifka,et al. Three hot-carrier degradation mechanisms in deep-submicron PMOSFET's , 1995 .
[20] Y. Pan,et al. A physical-based analytical model for hot-carrier induced saturation current degradation of p-MOSFET's , 1994 .
[21] G. Taylor,et al. Effects of hot-carrier trapping in n- and p-channel MOSFET's , 1983, IEEE Transactions on Electron Devices.
[22] Ping-Keung Ko,et al. Inversion-layer capacitance and mobility of very thin gate-Oxide MOSFET's , 1986 .
[23] G. Groeseneken,et al. Comparative study of hot-carrier degradation in p+ and n+ poly p-MOSFET's of a 0.5 μm CMOS technology , 1993, ESSDERC '93: 23rd European solid State Device Research Conference.
[24] Y. Pan. The Gate-to-drain Overlap Effects on the Hot-carrier Induced Degradation of LDD P-channel MOSFET's , 1993, ESSDERC '93: 23rd European solid State Device Research Conference.
[25] Karl Goser,et al. Characterization and model of the hot-carrier-induced offset voltage of analog CMOS differential stages , 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.
[26] W. Hansch,et al. The relationship between Oxide charge and device degradation: A comparative study of n- and p- channel MOSFET's , 1987, IEEE Transactions on Electron Devices.
[27] D. Schmitt-Landsiedel,et al. Influence of MOSFET I-V characteristics on switching delay time of CMOS inverters after hot-carriers stress , 1991, IEEE Electron Device Letters.
[28] Y.A. El-Mansy,et al. A simple two-dimensional model for IGFET operation in the saturation region , 1977, IEEE Transactions on Electron Devices.
[29] N. D. Arora,et al. Circuit design guidelines for n-channel MOSFET hot carrier robustness , 1993 .