Applications of the Thermal Step Method to the Characterization of Electric Charge in MOS Components
暂无分享,去创建一个
J.-L. Sanchez | Olivier Fruchier | Petru Notingher | Serge Agnel | Bernard Rousset | Alain Toureille | F. Forest | S. Cunningham
[1] Milton Ohring,et al. Reliability and Failure of Electronic Materials and Devices, Second Edition , 1998 .
[2] Daniel M. Fleetwood,et al. Thermally stimulated current measurements of SiO2 defect density and energy in irradiated metal-oxide-semiconductor capacitors , 1992 .
[3] Serge Agnel,et al. Thermal step method for space charge measurements under applied dc field , 2001 .
[4] Alain Toureille,et al. Distribution du champ électrique sous haute tension continue et gradient de température dans le diélectrique des câbles extrudés , 2006 .
[5] B. Rousset,et al. On the use of the thermal step method as a tool for characterizing thin layers and structures for micro and nano-electronics , 2004 .
[6] P. Notingher,et al. Industrial installation for voltage-on space measurements in HVDC cables , 2005, Fourtieth IAS Annual Meeting. Conference Record of the 2005 Industry Applications Conference, 2005..