Step and scan: the maturing technology

This paper reviews the status of step-and-scan technology. It reviews the main features of the technology and highlights its advantages over the conventional step-and-repeat technology. Data is presented to show the superior field distortion, linewidth control, and overlay performance offered by step-and-scan. The future direction of the technology is discussed in the context of the Semiconductor Industry Association (SIA) roadmap. It is indicated that the step-and-scan technique will allow optical lithography to extend below 180 nm resolution.