*Graphical Abstract Inductively Coupled Remote Plasma-Enhanced Chemical Vapor Deposition as a Versatile Route for the Deposition of Graphene Micro- and Nanostructures
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I. Šics | A. Goñi | G. Sauthier | L. Aballe | M. Foerster | E. Pellegrin | E. Pach | M. Cuxart | M. | H. M. Fernández | V. Carlino | Paradinas