论文信息 - White X-Ray Radiation Effects in MOS Capacitors With Atomic Layer Deposited HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> and Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Gate Dielectric Stacks for High Total Doses - 字舞流文

White X-Ray Radiation Effects in MOS Capacitors With Atomic Layer Deposited HfO₂/Al₂O₃ and Al₂O₃/HfO₂/Al₂O₃ Gate Dielectric Stacks for High Total Doses

Hongda Zhao | Q. Yuan | Shanfeng Wang | Bo Li | Huiping Zhu | Jian Jiao | Zichen Zhang | Lei Wang | Z. Zheng