论文信息 - Increased Growth Rate in a SiC CVD Reactor Using HCl as a Growth Additive - 字舞流文

Increased Growth Rate in a SiC CVD Reactor Using HCl as a Growth Additive

S. Saddow | S. Rao | O. Kordina | R. Myers-Ward | R. Everly | Z. Shishkin | Richard Everly