Titanium(IV) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method
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D. Batory | M. Śmietana | W. Szymański | M. Cichomski | M. Dudek | M. Dominik | A. Kisielewska | A. Jędrzejczak | M. Prowizor | W. Kozłowski | M. Smietana