Computer-aided development of a magnetron source with high target utilization
暂无分享,去创建一个
J. Gracio | Q. Fan | D. Galipeau | L. Zhou
[1] D. Depla,et al. The origin of Bohm diffusion, investigated by a comparison of different modelling methods , 2010 .
[2] J. Gracio,et al. A cross-corner effect in a rectangular sputtering magnetron , 2003 .
[3] Toshiaki Makabe,et al. Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge , 1999 .
[4] S. Kondo,et al. A self-consistent numerical analysis of a planar dc magnetron discharge by the particle-in-cell/Monte Carlo method , 1999 .
[5] J. Musil. Rectangular magnetron with full target erosion , 1999 .
[6] S. Rossnagel,et al. PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing , 1999 .
[7] D. Teer,et al. The tribological properties of MoS2/metal composite coatings deposited by closed field magnetron sputtering , 1997 .
[8] G. M. Turner,et al. Measured radial and angular distributions of sputtered atoms in a planar magnetron discharge , 1994 .
[9] S. Ido,et al. Computational Studies on the Shape and Control of Plasmas in Magnetron Sputtering Systems , 1993 .
[10] Q. Fan,et al. A symmetrical magnet magnetron-sputtering method for film deposition , 1993 .
[11] R. Howson,et al. Reactive sputtering with an unbalanced magnetron , 1992 .
[12] K. Wasa,et al. Handbook of sputter deposition technology , 1992 .
[13] J. Goree,et al. Magnetic field dependence of sputtering magnetron efficiency , 1991 .
[14] J. Goree,et al. Monte Carlo simulation of ionization in a magnetron plasma , 1990 .
[15] R. Kukla,et al. A highest rate self-sputtering magnetron source , 1990 .
[16] Matthew Goeckner,et al. Model of energetic electron transport in magnetron discharges , 1990 .
[17] H. R. Kaufman,et al. Current−voltage relations in magnetrons , 1988 .
[18] H. Kaufman,et al. Charge transport in magnetrons , 1987 .
[19] Nahar,et al. Elastic scattering of positrons and electrons by argon. , 1987, Physical review. A, General physics.
[20] H. Kaufman,et al. Induced drift currents in circular planar magnetrons , 1987 .
[21] S. Rossnagel,et al. Hollow‐cathode‐enhanced magnetron sputtering , 1986 .
[22] Noriaki Itoh,et al. Energy dependence of the ion-induced sputtering yields of monatomic solids , 1984 .
[23] K. Abe,et al. Planar magnetron sputtering cathode with deposition rate distribution controllability , 1982 .
[24] J. Vossen. Thin Film Processes , 1979 .
[25] D. Fraser,et al. Abstract: MOS metallization via automatic ’’S‐Gun’’ planetary deposition system , 1978 .
[26] D. Fraser. Abstract: High‐rate sputter deposition—circular magnetrons , 1978 .
[27] J. Shohet. The plasma state , 1971 .