Hydrogen-induced semimetal-semiconductor transition of two-dimensional ErSi2 detected by electron energy loss spectroscopy

Using high-resolution electron energy loss spectroscopy, we find that two-di men sio nal ErSi2 silicide epitaxially grown on Si(111) undergoes a semimetal-semiconductor transition upon atomic H dosing. Passivation of the Si top layer already inferred from previous photoemission work is directly demonstrated and provides further evidence of the similarity between the silicide surface atomic structure and the ideal Si(111) termination. Nevertheless, in contrast with the latter case it is shown by using simple chemical bonding and electron counting arguments that saturation of the Si dangling bonds cannot explain by itself the semiconducting nature of the hydrogenated silicide. Possible mechanisms that might account for the observed transition are discussed.

[1]  C. Pirri,et al.  Interaction of H with epitaxial Er silicide layers on Si(111) : adsorption versus absorption , 1996 .

[2]  A. Nishiyama,et al.  Interface structure of Si(111)-(√3 × √3)R30°-ErSi2 − x , 1996 .

[3]  Wetzel,et al.  Surface reconstruction of ErSi1.7(0001) investigated by scanning tunneling microscopy. , 1995, Physical review. B, Condensed matter.

[4]  Yuan,et al.  Effects of hydrogen on Er/p-type Si Schottky-barrier diodes. , 1995, Physical review. B, Condensed matter.

[5]  Wetzel,et al.  Surface states and reconstruction of epitaxial sqrt 3 x sqrt 3 R30 degrees Er silicide on Si(111). , 1994, Physical review. B, Condensed matter.

[6]  Tosatti,et al.  High temperature surface metallization of Ge(111) detected by electron energy loss spectroscopy. , 1994, Physical review letters.

[7]  Wetzel,et al.  Interfacial structure of two-dimensional epitaxial Er silicide on Si(111). , 1994, Physical review. B, Condensed matter.

[8]  Wetzel,et al.  Electronic structure and interfacial geometry of epitaxial two-dimensional Er silicide on Si(111). , 1993, Physical review. B, Condensed matter.

[9]  S. Louie,et al.  Electronic structure and its dependence on local order for H/Si(111)-(1×1) surfaces , 1993 .

[10]  T. Tan,et al.  The influence of growth techniques on the structure of epitaxial ErSi1.7 on Si(111) , 1993 .

[11]  Wetzel,et al.  Structure of a two-dimensional epitaxial Er silicide on Si(111) investigated by Auger-electron diffraction. , 1993, Physical review. B, Condensed matter.

[12]  T. Tan,et al.  Surface electronic structure of erbium silicide epitaxially grown on Si(111) , 1992 .

[13]  Plummer,et al.  Semiconductor-to-metal transition in an ultrathin interface: Cs/GaAs(110). , 1990, Physical review letters.

[14]  Y. Campidelli,et al.  Fabrication and structure of epitaxial Er silicide films on (111) Si , 1989 .

[15]  Northrup,et al.  Electronic structure, atomic structure, and the passivated nature of the arsenic-terminated Si(111) surface. , 1987, Physical review. B, Condensed matter.

[16]  D. Mills,et al.  Electron Energy Loss Spectroscopy and Surface Vibrations , 1982 .