论文信息 - Deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics - 字舞流文

Deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics

Shi-ming Chen | Shang-Che Tsai | Szu-yuan Chen | Zhedong Lin | Ming-Wei Lin | Tzu-Hung Yang | Jiandong Dai | Tzu-Hung Yang