Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning
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Olivier Joubert | Marc Fouchier | Erwine Pargon | Pascal Gouraud | C. Verove | K. Menguelti | Laurent Azarnouche | P. Gouraud | E. Pargon | O. Joubert | K. Menguelti | M. Fouchier | C. Verove | L. Azarnouche
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