Inductively coupled plasma deep etching of InP/InGaAsP in Cl2/CH4/H2 based chemistries with the electrode at 20 °C
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Brian Corbett | Frank H. Peters | Vladimir Djara | James O'Callaghan | B. Corbett | J. O'Callaghan | F. Peters | V. Djara | A. Wieczorek | K. Thomas | Andreas Wieczorek | Kevin Thomas
[1] R. Wasielewski,et al. Fabrication of submicron-sized features in InP/InGaAsP/AlGaInAs quantum well heterostructures by optimized inductively coupled plasma etching with Cl2/Ar/N2 chemistry , 2010 .
[2] Fow-Sen Choa,et al. Smooth and vertical-sidewall InP etching using Cl2/N2 inductively coupled plasma , 2004 .
[3] S. Forrest,et al. Photonic integration using asymmetric twin-waveguide (ATG) technology: part I-concepts and theory , 2005, IEEE Journal of Selected Topics in Quantum Electronics.
[4] Sun Changzheng,et al. Vertical and smooth, etching of InP by Cl2/CH4/Ar inductively coupled plasma at room temperature , 2003 .
[6] T. Kazior,et al. High rate CH4:H2 plasma etch processes for InP , 1997 .
[7] C. Cardinaud,et al. Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy , 2012 .
[8] B. Corbett,et al. Loss analysis and increasing of the fabrication tolerance of resonant coupling by tapering the mode beating section , 2011 .
[9] Tao Mei,et al. Study and optimization of room temperature inductively coupled plasma etching of InP using Cl2/CH4/H2 and CH4/H2 , 2006 .
[10] S. J. Pearton,et al. Etching of InP at ≳1 μm/min in Cl2/Ar plasma chemistries , 1996 .
[11] Joseph H. Abeles,et al. Effect of H2 on the etch profile of InP/InGaAsP alloys in Cl2/Ar/H2 inductively coupled plasma reactive ion etching chemistries for photonic device fabrication , 2002 .
[12] Ingrid Moerman,et al. A review on fabrication technologies for the monolithic integration of tapers with III-V semiconductor devices , 1997 .
[13] Sophie Bouchoule,et al. Optimization of a Cl2–H2 inductively coupled plasma etching process adapted to nonthermalized InP wafers for the realization of deep ridge heterostructures , 2006 .
[14] Jean-Pierre Vilcot,et al. Low-loss InGaAsP/InP submicron optical waveguides fabricated by ICP etching , 2004 .
[15] Seng-Tiong Ho,et al. InGaAsP-InP nanoscale waveguide-coupled microring lasers with submilliampere threshold current using Cl/sub 2/--N/sub 2/-based high-density plasma etching , 2005 .
[16] Lee Chee-Wei,et al. Room-Temperature Inductively Coupled Plasma Etching of InP Using Cl 2 N 2 and Cl 2 /CH 4 /H 2 , 2006 .