The effects of scaling on the performance of small-signal MOS amplifiers

Abstract The impact of scaling of the CMOS technology on the performance of small-signal MOS amplifiers is evaluated by analytical models and physics-based device simulation. The limitations set by non-ideal scaling of the electrical characteristics of the MOSFET and their implications on the trade-off between power dissipation and performance are analyzed and discussed. The results reported in this paper give indications about the improvements and limitations that may be expected as the technology is scaled below 0.1 μm and provide indications regarding technology options (e.g. bulk vs. SOI MOSFETs) and different possible approaches for scaling the bias current as CMOS miniaturization proceeds.

[1]  T. Ohguro,et al.  The impact of scaling down to deep-submicron on CMOS RF circuits , 1998, Proceedings of the 23rd European Solid-State Circuits Conference.

[2]  Anne-Johan Annema,et al.  Analog circuit performance and process scaling , 1999 .

[3]  Eric A. Vittoz,et al.  Micropower Techniques , 1994 .

[4]  S. Takagi,et al.  On the universality of inversion layer mobility in Si MOSFET's: Part I-effects of substrate impurity concentration , 1994 .

[5]  Y. Tsividis Operation and modeling of the MOS transistor , 1987 .

[6]  P. Woerlee,et al.  A simple model for quantisation effects in heavily-doped silicon MOSFETs at inversion conditions , 1994 .

[7]  E. Morifuji,et al.  High-frequency AC characteristics of 1.5 nm gate oxide MOSFETs , 1996, International Electron Devices Meeting. Technical Digest.

[8]  Enrico Sangiorgi,et al.  Scaling the MOS transistor below 0.1 /spl mu/m: methodology, device structures, and technology requirements , 1994 .

[9]  L. Selmi,et al.  Low field mobility of ultra-thin SOI N- and P-MOSFETs: Measurements and implications on the performance of ultra-short MOSFETs , 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

[10]  D. J. Allstot,et al.  A multistage amplifier technique with embedded frequency compensation , 1999, IEEE J. Solid State Circuits.

[11]  M. Vertregt,et al.  CMOS technology for mixed signal ICs , 1997 .

[12]  W. Sansen,et al.  Analog circuit design in scaled CMOS technology , 1996, 1996 Symposium on VLSI Circuits. Digest of Technical Papers.

[13]  S. Takagi,et al.  Impact of electron and hole inversion-layer capacitance on low voltage operation of scaled n- and p-MOSFET's , 2000 .

[14]  R.H. Dennard,et al.  Design Of Ion-implanted MOSFET's with Very Small Physical Dimensions , 1974, Proceedings of the IEEE.

[15]  G. Baccarani,et al.  Generalized scaling theory and its application to a ¼ micrometer MOSFET design , 1984, IEEE Transactions on Electron Devices.

[16]  Denis Flandre,et al.  A gm/ID based methodology for the design of CMOS analog circuits and its application to the synthesis of a silicon-on-insulator micropower OTA , 1996, IEEE J. Solid State Circuits.

[17]  J. L. Lentz,et al.  An improved electron and hole mobility model for general purpose device simulation , 1997 .