Accelerated Publication: Patterning of polystyrene thin films by solvent-assisted imprint lithography and controlled dewetting

This paper presents an innovative approach for the preparation of polystyrene (PS) micropatterns by using solvent-assisted imprinting lithography and demonstrates a controlled dewetting process for fabricating an ordered nanostructure from a polymer thin film. Uniform PS pattern can be fabricated at room temperature and low pressure (0.01MPa) by a solvent-assisted imprinting method. The imprinted PS microlens marked change in morphology from dome to sphere because a spinodal dewetting process occurs after the acetone treatment. By adjusting the thickness of residual layer between imprinted domes, the orderly self-organized PS sphere arrays with bimodal and even multiple sizes can be fabricated. The combination of solvent-assisted imprinting and templated self-organization can be an effective method for the preparation of complex patterns with multiple sizes, which is not easy to be obtained with conventional photolithography process. Furthermore, the sub-micrometer PS pre-pattern can turn into photonic crystal arrays with 550nm pitch by this dewetting process.

[1]  Ullrich Steiner,et al.  Solvent‐Vapor‐Assisted Imprint Lithography , 2007 .

[2]  Yanchun Han,et al.  Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography , 2004 .

[3]  Masatsugu Shimomura,et al.  Formation of ordered mesoscopic polymer arrays by dewetting. , 1999, Chaos.

[4]  A. M. Higgins,et al.  Anisotropic spinodal dewetting as a route to self-assembly of patterned surfaces , 2000, Nature.

[5]  D. F. Evans,et al.  Nucleation and Growth of Defects Leading to Dewetting of Thin Polymer Films , 1997 .

[6]  M. Hon,et al.  Soft imprint lithography using swelling/deswelling characteristics of a polymer mold and a resist induced by a poor solvent , 2009 .

[7]  Ashutosh Sharma,et al.  Control of morphology in pattern directed dewetting of thin polymer films , 2008 .

[8]  Fengchao Xie,et al.  Microscopic Surface Patterning by Rubbing Induced Dewetting , 2005 .

[9]  Jozef Bicerano,et al.  Prediction of Polymer Properties , 1996 .

[10]  L. J. Guo,et al.  Nanoimprint Lithography: Methods and Material Requirements , 2007 .

[11]  É. Favre.  Swelling of crosslinked polydimethylsiloxane networks by pure solvents: Influence of temperature , 1996 .

[12]  Ho-Cheol Kim,et al.  Nanopatterning of thin polymer films by controlled dewetting on a topographic pre-pattern. , 2008, Soft matter.

[13]  O. Karthaus,et al.  Reversible Shape Change of Polymer Microdroplets in a Two-Dimensional Array , 2006 .

[14]  G. Whitesides,et al.  Solvent compatibility of poly(dimethylsiloxane)-based microfluidic devices. , 2003, Analytical chemistry.

[15]  G. Reiter.  Unstable thin polymer films: rupture and dewetting processes , 1993 .

[16]  D. Khang,et al.  Room-temperature imprint lithography by solvent vapor treatment , 2000 .

[17]  K. Winey,et al.  Unstable Polymer Bilayers. 1. Morphology of Dewetting , 1995 .

[18]  M. Shimomura,et al.  Aggregation of Dendrimers with a Photochromic Dithienylethene Core Group on the Mica Surface-Atomic Force Microscopic Imaging , 1998 .

[19]  A. Chauhan,et al.  Influence of physical and chemical heterogeneity shape on thin film rupture. , 2006, Journal of colloid and interface science.

[20]  张哉根,et al.  Leu-M , 1991 .

[21]  A. Karim,et al.  Hole-growth instability in the dewetting of evaporating polymer solution films†‡ , 2002 .