Photoetching focusing parameter testing method and system

The invention discloses a photoetching focusing parameter testing method and system. The method includes dividing the surface of a test wafer into multiple test areas; allocating a pretest focusing parameter Fpi for each test area i; according to height Hi of each test area I, correcting each pretest focusing parameter Fpi to acquire a focusing parameter Fi actually used for testing; performing photoetching imaging on each test area I according to the focusing parameters Fi actually used for testing. The test system uses the test method. By the method, the pretest focusing parameters are corrected to allow test results to be more accurate.