Optoelectronic integration of polymer waveguide array and metal-semiconductor-metal photodetector through micromirror couplers

We report the design and formation of a high-performance polymer waveguide array with 45/spl deg/ micromirror couplers for achieving fully embedded board-level optoelectronic interconnects. We have used Si CMOS process compatible polymer as the fabrication material, which is relatively easy to process and has low propagation loss at 850-nm wavelength, 45/spl deg/ total interior reflection (TIR) micromirror couplers fabricated within the channel waveguides provide surface-normal light coupling between the waveguide and the optoelectronic devices, thus forming a fully embedded three-dimensional optoelectronic interconnect. We have demonstrated a hybrid optoelectronic integrated system of GaAs MSM photodetector array and polymer channel waveguide array with 45/spl deg/ micromirror couplers, showing an aggregate 3-dB bandwidth of 32 GHz.

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