论文信息 - Improvement of Ta-based thin film barriers on copper by ion implantation of nitrogen and oxygen - 字舞流文

Improvement of Ta-based thin film barriers on copper by ion implantation of nitrogen and oxygen

C. Wenzel | J. Bartha | A. Mücklich | B. Adolphi | H. Reuther | D. Fischer | J. Schreiber | E. Wieser | B. Bendjus | V. Melov | M. Peikert