论文信息 - C and Si delta doping in Ge by CH3SiH3 using reduced pressure chemical vapor deposition - 字舞流文

C and Si delta doping in Ge by CH3SiH3 using reduced pressure chemical vapor deposition

B. Tillack | Yuji Yamamoto | A. Mai | M. Sakuraba | J. Murota | N. Ueno | Y. Yamamoto | Naofumi Ueno