Multispectral characterization of diffractive micromirror arrays

The present article discusses an optical concept for the characterization of diffractive micromirror arrays (MMAs) within an extended wavelength range from the deep ultra-violet up to near-infrared. The task derives from the development of a novel class of MMAs that will support programmable diffractive properties between 240 nm and 800 nm. The article illustrates aspects of the achromatic system design that comprises the reflective beam homogenization with divergence control and coherence management for an appropriate MMA illumination as well as the transfer of phase modulating MMA patterns into intensity profiles for contrast imaging. Contrast measurements and grey scale imaging demonstrate the operation of the characterization system and reflect the encouraging start of technology development for multispectral, diffractive MMAs.

[1]  Per Askebjer,et al.  Pattern generation with SLM imaging , 2002, SPIE Photomask Technology.

[2]  Reinhard Voelkel,et al.  Microlens laser beam homogenizer: from theory to application , 2007, SPIE Organic Photonics + Electronics.

[3]  Peter Dannberg,et al.  Homogeneous LED-illumination using microlens arrays , 2005, SPIE Optics + Photonics.

[4]  Lars Erdmann,et al.  Coherence management for microlens laser beam homogenizers , 2002, SPIE Optics + Photonics.

[5]  Y. Lin,et al.  Characterization of excimer lasers for application to lenslet array homogenizers. , 2000, Applied optics.

[6]  C. M. Jefferson,et al.  Design and performance of a refractive optical system that converts a Gaussian to a flattop beam. , 2000, Applied optics.

[7]  Robert Brunner,et al.  Microscope illumination systems for 157 nm , 2003, SPIE Advanced Lithography.

[8]  Tor Sandstrom,et al.  RET for optical maskless lithography , 2004, SPIE Advanced Lithography.

[9]  P. Dürr,et al.  Contrast properties of spatial light modulators for microlithography , 2007, SPIE Photomask Technology.

[10]  J Ihlemann,et al.  Optimization of a beam delivery system for a short-pulse KrF laser used for material ablation. , 1997, Applied optics.

[11]  Fred M. Dickey,et al.  Laser Beam Shaping , 2003 .

[12]  Yao-Ching Ku,et al.  Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making , 2007, Photomask Japan.

[13]  M. Eckert,et al.  Technology development of diffractive micromirror arrays for the deep ultraviolet to the near infrared spectral range , 2010, Photonics Europe.

[14]  Hiroyuki Furuya,et al.  L-9: Late-News Paper: Laser Projection Display with Low Electric Consumption and Wide Color Gamut by Using Efficient Green SHG Laser and New Illumination Optics , 2006 .

[15]  Reinhard Voelkel,et al.  Laser beam homogenizing: limitations and constraints , 2008, Optical Systems Design.

[16]  B. Dingel.  Speckle Reduction with Virtual Incoherent Laser Illumination Using a Modified Fiver Array , 1993 .