Fluorine ion etching of lead zirconate‐titanate thin films
暂无分享,去创建一个
Michael Sayer | Lichun Zou | Woon-Ming Lau | M. Sayer | I. Bello | L. Zou | W. Lau | I. Bello
[1] H. F. Winters,et al. Surface Science Aspects of Etching Reactions , 1992 .
[2] I. Bello,et al. Construction, characterization and applications of a compact mass-resolved low-energy ion beam system , 1991 .
[3] W. M. Haynes. CRC Handbook of Chemistry and Physics , 1990 .
[4] Jai Ho Choi,et al. Reactive Ion Etching of Sputtered PbZr1-xTixO3 Thin Films , 1992 .
[5] M. Sayer,et al. Ferroelectrics for semiconductor devices , 1992 .
[6] R. C. Weast. Handbook of chemistry and physics , 1973 .
[7] C. E. Land. Longitudinal Electrooptic Effects and Photosensitivities of Lead Zirconate Titanate Thin Films , 1989 .
[8] R. Behrisch,et al. Sputtering by Particle Bombardment III , 1981 .
[9] D.W. Bondurant,et al. Ferroelectrics for nonvolatile RAMs , 1989, IEEE Spectrum.