Area Optimization in 6T and 8T SRAM Cells Considering Vth Variation in Future Processes

This paper shows that an 8T SRAM cell is superior to a 6T cell in terms of cell area in a future process. At a 65-nm node and later, the 6T cell comprised of the minimum-channel-length transistors cannot make the minimum area because of threshold-voltage variation. In contrast, the 8T cell can employ the optimized transistors and achieves the minimum area even if it is used as a single-port SRAM. In a 32-nm process, the 8T-cell area is smaller than the 6T cell by 14.6% at a supply voltage of 0.8 V. We also discuss the area and access time comparisons between the 6T-SRAM and 8T-SRAM macros.

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