Chapter 8 Electronic and Optical Properties of III–V Nitride based Quantum Wells and Superlattices
暂无分享,去创建一个
[1] Gérald Bastard,et al. Electronic states in semiconductor heterostructures , 1986 .
[2] H. Morkoç,et al. Optical transitions in GaN/AlxGa1−xN multiple quantum wells grown by molecular beam epitaxy , 1996 .
[3] H. Morkoç,et al. Theoretical investigation of electrical characteristics of AlGaN/GaN modulation doped field‐effect transistors , 1996 .
[4] Arto V. Nurmikko,et al. Low voltage, room temperature, ridge waveguide green-blue diode laser , 1993 .
[5] Raphael Tsu,et al. Superlattice and negative differential conductivity in semiconductors , 1970 .
[6] R. Bechmann,et al. Numerical data and functional relationships in science and technology , 1969 .
[7] Fred H. Pollak,et al. Piezo-Electroreflectance in Ge, GaAs, and Si , 1968 .
[8] Michael Kunzer,et al. Determination of the GaN/AlN band offset via the (/0) acceptor level of iron , 1994 .
[9] H. Amano,et al. Heteroepitaxial Growth and the Effect of Strain on the Luminescent Properties of GaN Films on (11 2̄0) and (0001) Sapphire Substrates , 1988 .
[10] R. Davis. III-V nitrides for electronic and optoelectronic applications , 1991, Proc. IEEE.
[11] Kevin F. Brennan,et al. Quantum Semiconductor Structures , 1992 .
[12] J. Tsao,et al. Erratum: Relaxation of strained‐layer semiconductor structures via plastic flow [Appl. Phys. Lett. 51, 1325 (1987)] , 1988 .
[13] H. Morkoç,et al. Quasi-Fermi level bending in MODFET's and its effect on FET transfer characteristics , 1985, IEEE Transactions on Electron Devices.
[14] Takashi Mukai,et al. Cd-Doped InGaN Films Grown on GaN Films , 1993 .
[15] M. Craford. LEDs challenge the incandescents , 1992, IEEE Circuits and Devices Magazine.
[16] Hadis Morkoç,et al. Valence-band discontinuity between GaN and AlN measured by x-ray photoemission spectroscopy , 1994 .
[17] G. Bastard,et al. Theoretical investigations of superlattice band structure in the envelope-function approximation , 1982 .
[18] Gil,et al. Oscillator strengths for optical band-to-band processes in GaN epilayers. , 1996, Physical review. B, Condensed matter.
[19] Michael S. Shur,et al. The influence of the strain‐induced electric field on the charge distribution in GaN‐AlN‐GaN structure , 1993 .
[20] Hadis Morkoç,et al. Valence‐band discontinuities of wurtzite GaN, AlN, and InN heterojunctions measured by x‐ray photoemission spectroscopy , 1996 .
[21] Jeffrey Y. Tsao,et al. Relaxation of strained-layer semiconductor structures via plastic flow , 1987 .
[22] J. Waldrop,et al. Measurement of AlN/GaN (0001) heterojunction band offsets by x‐ray photoemission spectroscopy , 1996 .
[23] H. Morkoç,et al. Properties of a Si doped GaN/AlGaN single quantum well , 1995 .
[24] D. L. Smith,et al. Strain-generated electric fields in [111] growth axis strained-layer superlattices , 1986 .
[25] M. Balkanski,et al. Structure de bandes des cristaux de type wurtzite. Transitions optiques intrinsèques dans le CdS , 1960 .
[26] H. Morkoç,et al. Binding energies of acceptors in GaAs- Al x Ga 1 − x As quantum wells , 1983 .
[27] D. C. Reynolds,et al. Ground and excited state exciton spectra from GaN grown by molecular‐beam epitaxy , 1996 .
[28] Kim,et al. Envelope-function formalism for valence bands in wurtzite quantum wells. , 1996, Physical review. B, Condensed matter.
[29] Takashi Matsuoka,et al. Photoluminescence of InGaN films grown at high temperature by metalorganic vapor phase epitaxy , 1991 .
[30] Larry A. Coldren,et al. Growth and characterization of bulk InGaN films and quantum wells , 1996 .
[31] Lester F. Eastman,et al. 75 Å GaN channel modulation doped field effect transistors , 1996 .
[32] Isamu Akasaki,et al. Widegap Column‐ III Nitride Semiconductors for UV/Blue Light Emitting Devices , 1994 .
[33] W. J. Choyke,et al. Growth of AlN/GaN layered structures by gas source molecular‐beam epitaxy , 1990 .
[34] D. G. Thomas,et al. Theoretical and Experimental Effects of Spatial Dispersion on the Optical Properties of Crystals , 1963 .
[35] Y.-F. Wu,et al. Measured microwave power performance of AlGaN/GaN MODFET , 1996, IEEE Electron Device Letters.
[36] Tanakorn Osotchan,et al. Electron mobilities in gallium, indium, and aluminum nitrides , 1994 .
[37] Michael S. Shur,et al. Temperature activated conductance in GaN/AlGaN heterostructure field effect transistors operating at temperatures up to 300 °C , 1995 .
[38] Yotaro Murakami,et al. Preparation and optical properties of Ga1−xInxN thin films , 1975 .
[39] Reuben T. Collins,et al. Field‐effect transistor structure based on strain‐induced polarization charges , 1990 .
[40] S. Nakamura,et al. InGaN-Based Multi-Quantum-Well-Structure Laser Diodes , 1996 .
[41] H. Amano,et al. Shortest wavelength semiconductor laser diode , 1996 .
[42] Suzuki,et al. First-principles calculations of effective-mass parameters of AlN and GaN. , 1995, Physical review. B, Condensed matter.
[43] Scheffler,et al. Electronic and structural properties of GaN by the full-potential linear muffin-tin orbitals method: The role of the d electrons. , 1993, Physical review. B, Condensed matter.
[44] B. Segall,et al. Band-Offsets Between Group-III-Nitrides , 1994 .
[45] Michael S. Shur,et al. Short-channel GaN/AlGaN doped channel heterostructure field effect transistors with 36.1 cutoff frequency , 1996 .
[46] Alan E. Bell,et al. NEXT-GENERATION COMPACT DISCS , 1996 .
[47] Umesh K. Mishra,et al. VERY HIGH BREAKDOWN VOLTAGE AND LARGE TRANSCONDUCTANCE REALIZED ON GAN HETEROJUNCTION FIELD EFFECT TRANSISTORS , 1996 .
[48] Isamu Akasaki,et al. High‐quality GaInN/GaN multiple quantum wells , 1996 .
[49] H. Morkoç,et al. Strained layer heterostructures, and their applications to MODFETs, HBTs, and lasers , 1993, Proc. IEEE.
[50] M. Khan,et al. Photoluminescence characterization of AlGaN-GaN pseudomorphic quantum wells and calculation of strain induced bandgap shifts , 1992 .
[51] Marc Ilegems,et al. Absorption, Reflectance, and Luminescence of GaN Epitaxial Layers , 1971 .
[52] H. Morkoç,et al. Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies , 1994 .
[53] P. Asthana. A long road to overnight success [optical disc storage] , 1994, IEEE Spectrum.
[54] G. Osbourn. Novel material properties of strained‐layer superlattices , 1985 .
[55] D. Ahn. Qualitative estimation of optical gain in wide‐band‐gap semiconductor quantum wells , 1994 .
[56] Takashi Mukai,et al. High-Quality InGaN Films Grown on GaN Films , 1992 .
[57] Hadis Morkoç,et al. Emerging gallium nitride based devices , 1995, Proc. IEEE.
[58] H. Morkoç,et al. GaN, AlN, and InN: A review , 1992 .
[59] J. Orton. Acceptor binding energy in GaN and related alloys , 1995 .
[60] Y. P. Varshni. Temperature dependence of the energy gap in semiconductors , 1967 .
[61] Kazuo Nakajima,et al. Fundamental absorption edge in GaN, InN and their alloys , 1972 .
[62] M. Khan,et al. Optical characterization of AlGaN-GaN-AlGaN quantum wells , 1992 .
[63] Hadis Morkoç,et al. High transconductance normally-off GaN MODFETs , 1995 .
[64] S. Mohammad,et al. High-Luminosity Blue and Blue-Green Gallium Nitride Light-Emitting Diodes , 1995, Science.
[65] Shun Lien Chuang,et al. k.p method for strained wurtzite semiconductors , 1996 .
[66] H. Morkoc,et al. On the collapse of drain I-V characteristics in modulation-doped FET's at cryogenic temperatures , 1984, IEEE Transactions on Electron Devices.
[67] Takeshi Kuboyama,et al. Properties of Ga1-xInxN Films Prepared by MOVPE , 1989 .
[68] R. Kolbas,et al. Photoluminescence characteristics of AlGaN‐GaN‐AlGaN quantum wells , 1990 .
[69] T. Drummond,et al. Modulation-doped GaAs/(Al,Ga)As heterojunction field-effect transistors: MODFETs , 1986 .
[70] R. People,et al. Calculation of critical layer thickness versus lattice mismatch for GexSi1−x/Si strained‐layer heterostructures , 1985 .
[71] Chang Yc,et al. Optical properties in modulation-doped GaAs-Ga1-xAlxAs quantum wells. , 1985 .
[72] M. Klein. Phonons in semiconductor superlattices , 1986 .
[73] M.A. Khan,et al. Microwave operation of GaN/AlGaN-doped channel heterostructure field effect transistors , 1996, IEEE Electron Device Letters.
[74] Shuji Nakamura,et al. InGaN Multi-Quantum-Well-Structure Laser Diodes with Cleaved Mirror Cavity Facets , 1996 .
[75] C. Weisbuch,et al. Quantum Semiconductor Structures: Fundamentals and Applications , 1991 .
[76] H. Amano,et al. P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI) , 1989 .
[77] Takashi Mukai,et al. High-Power GaN P-N Junction Blue-Light-Emitting Diodes , 1991 .
[78] S. Nakamura,et al. High-Brightness InGaN Blue, Green and Yellow Light-Emitting Diodes with Quantum Well Structures , 1995 .
[79] A. Kuramata,et al. High‐quality GaN epitaxial layer grown by metalorganic vapor phase epitaxy on (111) MgAl2O4 substrate , 1995 .
[80] D. C. Reynolds,et al. Sharp-line photoluminescence spectra from GaAs-GaAlAs multiple-quantum-well structures , 1984 .
[81] Takeshi Uenoyama,et al. Valence subband structures of wurtzite GaN/AlGaN quantum wells , 1995 .
[82] Heinrich,et al. Deep-level impurities: A possible guide to prediction of band-edge discontinuities in semiconductor heterojunctions. , 1985, Physical review letters.
[83] Shuji Nakamura,et al. InGaN multi‐quantum‐well structure laser diodes grown on MgAl2O4 substrates , 1996 .
[84] T. Matsuoka,et al. Wide-gap semiconductor InGaN and InGaAln grown by MOVPE , 1992 .
[85] Inspec,et al. Properties of group III nitrides , 1994 .
[86] H. Morkoç,et al. Photoluminescence characterization of the quantum well structure and influence of optical illumination on the electrical performance of AlGaN/GaN modulation‐doped field‐effect transistors , 1996 .
[87] J. W. Matthews,et al. Defects in epitaxial multilayers: III. Preparation of almost perfect multilayers , 1976 .
[88] Vladimir Dmitriev,et al. Spontaneous and stimulated emission from photopumped GaN grown on SiC , 1995 .
[89] W. Shan,et al. Pressure‐dependent photoluminescence study of wurtzite GaN , 1995 .
[90] M. Paisley,et al. AlN/GaN superlattices grown by gas source molecular beam epitaxy , 1991 .
[91] Michael S. Shur,et al. Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias , 1994 .
[92] Takashi Mukai,et al. InxGa(1−x)N/InyGa(1−y)N superlattices grown on GaN films , 1993 .
[93] Gil,et al. Valence-band physics and the optical properties of GaN epilayers grown onto sapphire with wurtzite symmetry. , 1995, Physical review. B, Condensed matter.
[94] H. Amano,et al. p‐type conduction in Mg‐doped Ga0.91In0.09N grown by metalorganic vapor‐phase epitaxy , 1995 .
[95] S. Kamiyama,et al. Optical Gain Calculation of Wurtzite GaN/AlGaN Quantum Well Laser , 1995 .
[96] H. Amano,et al. Metalorganic Vapor Phase Epitaxial Growth and Properties of GaN/Al0.1Ga0.9N Layered Structures , 1991 .
[97] H. Morkoç,et al. SUPPRESSION OF LEAKAGE CURRENTS AND THEIR EFFECT ON THE ELECTRICAL PERFORMANCE OF ALGAN/GAN MODULATION DOPED FIELD-EFFECT TRANSISTORS , 1996 .