2-D MOSFET modeling including surface effects and impact ionization by self-consistent solution of the Boltzmann, Poisson, and hole-continuity equations

We present a new two-dimensional (2-D) MOSFET simulation method achieved by directly solving the Boltzmann transport equation for electrons, the hole-current continuity equation, and the Poisson equation self-consistently. The spherical harmonic method is used for the solution of the Boltzmann equation. The solution directly gives the electron distribution function, electrostatic potential, and the hole concentration for the entire 2-D MOSFET. Average quantities such as electron concentration and electron temperature are obtained directly from the integration of the distribution function. The collision integral is formulated to arbitrarily high spherical harmonic order, and new collision terms are included that incorporate effects of surface scattering and electron-hole pair recombination/generation. I-V characteristics, which agree with experiment, are calculated directly from the distribution function for an LDD submicron MOSFET. Electron-hole pair generation due to impact ionization is also included by direct application of the collision integral. The calculations are efficient enough for day-to-day engineering design on workstation-type computers.

[1]  A. Gnudi,et al.  Two-dimensional NOSFET Simulation by means of Multidimensional Spherical Harmonics Expansion of the Boltzmann Transport Equation , 1992, ESSDERC '92: 22nd European Solid State Device Research conference.

[2]  P. A. Childs,et al.  Spatially transient hot electron distributions in silicon determined from the chambers path integral solution of the Boltzmann transport equation , 1993 .

[3]  Numerical simulation of non-homogeneous submicron semiconductor devices by a deterministic particle method , 1993 .

[4]  Isaak D. Mayergoyz,et al.  A globally convergent algorithm for the solution of the steady‐state semiconductor device equations , 1990 .

[5]  S. Russek,et al.  Semi-empirical equations for electron velocity in silicon: Part II—MOS inversion layer , 1983, IEEE Transactions on Electron Devices.

[6]  Theodore I. Kamins,et al.  Device Electronics for Integrated Circuits , 1977 .

[7]  Philip A. Mawby,et al.  Hydrodynamic simulation of electron heating in conventional and lightly-doped-drain MOSFETs with application to substrate current calculation , 1992 .

[8]  P. T. Landsberg,et al.  Impact ionization and auger recombination in bands , 1972 .

[9]  M. Stettler,et al.  Formulation of the Boltzmann equation in terms of scattering matrices , 1993 .

[10]  N. Goldsman,et al.  Deterministic MOSFET simulation using a generalized spherical harmonic expansion of the Boltzmann equation , 1995 .

[11]  Stephen M. Goodnick,et al.  Surface roughness induced scattering and band tailing , 1982 .

[12]  S. Selberherr Analysis and simulation of semiconductor devices , 1984 .

[13]  Neil Goldsman,et al.  Highly stable and routinely convergent 2-dimensional hydrodynamic device simulation , 1994 .

[14]  C. Fiegna,et al.  Modeling of high-energy electrons in MOS devices at the microscopic level , 1993 .

[15]  T. H. Ning,et al.  The scattering of electrons by surface oxide charges and by lattice vibrations at the silicon-silicon dioxide interface , 1972 .

[16]  W. L. Engl,et al.  The influence of the thermal equilibrium approximation on the accuracy of classical two-dimensional numerical modeling of silicon submicrometer MOS transistors , 1988 .

[17]  N. Goldsman,et al.  An efficient deterministic solution of the space-dependent Boltzmann transport equation for silicon , 1992 .

[18]  Antonio Gnudi,et al.  Modeling impact ionization in a BJT by means of spherical harmonics expansion of the Boltzmann transport equation , 1993, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[19]  G. Arfken Mathematical Methods for Physicists , 1967 .

[20]  N. Goldsman,et al.  A generalized Legendre polynomial/sparse matrix approach for determining the distribution function in non-polar semiconductors , 1993 .

[21]  K. Hess Advanced Theory of Semiconductor Devices , 1999 .

[22]  Roberto Guerrieri,et al.  A new discretization strategy of the semiconductor equations comprising momentum and energy balance , 1988, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[23]  N. Goldsman,et al.  Device modeling by deterministic self-consistent solution of Poisson and Boltzmann transport equations , 1992 .

[24]  N. Goldsman,et al.  A physics-based analytical/numerical solution to the Boltzmann transport equation for use in device simulation , 1991 .

[25]  Massimo Vanzi,et al.  A physically based mobility model for numerical simulation of nonplanar devices , 1988, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[26]  U. Ravaioli,et al.  An improved energy transport model including nonparabolicity and non-Maxwellian distribution effects , 1992, IEEE Electron Device Letters.

[27]  Young-June Park,et al.  A time dependent hydrodynamic device simulator SNU-2D with new discretization scheme and algorithm , 1994, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[28]  Siegfried Selberherr,et al.  A novel method for extracting the two-dimensional doping profile of a sub-half micron MOSFET , 1994, Proceedings of 1994 VLSI Technology Symposium.

[29]  B. Riccò,et al.  A many-band silicon model for hot-electron transport at high energies , 1989 .