Deposition of SiO2 films by low-energy ion-beam induced chemical vapor deposition using hexamethyldisiloxane
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Takaomi Matsutani | Masato Kiuchi | M. Kiuchi | Chang Liu | T. Matsutani | T. Asanuma | T. Takeuchi | Chang Liu | T. Asanuma | Takae Takeuchi | Tatsuya Asanuma
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