Thermal diffusivities of thin diamond films on silicon

Abstract Photothermal displacement spectroscopy at transient thermal gratings was used to characterize the thermal diffusivity of diamond films several microns thick grown by microwave plasma chemical vapour deposition on silicon substrates. With this very local lateral sensitive method a rather large variation in thermal diffusivities values was obtained, covering the range from 0.2 to 1.7 cm 2 s −1 . The thermal properties are related to the structural properties investigated by electron microscope imaging and Raman spectroscopy.