Etching of sub-micrometer structures through Stencil

Resistless processes to realize the pattern transfer of your designs into the substrate present some advantages, as the reduction in fabrication steps. Stencil Lithography (SL) is one of the most used resistless processes and, up to now, it has mainly been used to perform local selective deposition of materials. Here, the local etching of different substrates through a stencil hard mask is presented. The compatibility with different etching conditions, the scalability of the technique and the main challenges are described. Minimum feature dimensions of 500nm in polysilicon and 200nm in LS-SiN is presented.

[1]  Tunable hydrophilicity on a hydrophobic fluorocarbon polymer coating on silicon , 2006 .

[2]  Janko Auerswald,et al.  Fabrication of metallic patterns by microstencil lithography on polymer surfaces suitable as microelectrodes in integrated microfluidic systems , 2006 .

[3]  J. Brugger,et al.  Silicon-Supported Membranes for Improved Large-Area and High-Density Micro/Nanostencil Lithography , 2006, Journal of Microelectromechanical Systems.

[4]  G. Abadal,et al.  Micro/nanomechanical resonators for distributed mass sensing with capacitive detection , 2006 .

[5]  Jürgen Brugger,et al.  Deep-ultraviolet–microelectromechanical systems stencils for high-throughput resistless patterning of mesoscopic structures , 2004 .

[6]  Kai Kolari,et al.  Deep plasma etching of glass with a silicon shadow mask , 2008 .

[7]  Konstantinos P. Giapis,et al.  Maskless etching of silicon using patterned microdischarges , 2001 .

[8]  Jürgen Brugger,et al.  Synthesis of localized 2D‐layers of silicon nanoparticles embedded in a SiO2 layer by a stencil‐masked ultra‐low energy ion implantation process , 2007 .

[9]  Miko Elwenspoek,et al.  Resistless patterning of sub-micron structures by evaporation through nanostencils , 2000 .

[10]  Marc A. F. van den Boogaart,et al.  Corrugated membranes for improved pattern definition with micro/nanostencil lithography , 2006 .

[11]  Julien Arcamone,et al.  Dry etching for the correction of gap-induced blurring and improved pattern resolution in nanostencil lithography , 2007 .

[12]  H. Kawakatsu,et al.  Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching , 2004 .

[13]  Daniel C. Ralph,et al.  Nanofabrication using a stencil mask , 1999 .

[14]  M. Geis,et al.  Pattern transfer by dry etching through stencil masks , 1988 .