High voltage AlGaN/GaN metal–oxide–semiconductor high-electron mobility transistors with regrown In0.14Ga0.86N contact using a CMOS compatible gold-free process
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Y. Yeo | D. Chi | Xinke Liu | Wei Liu | L. Tan | Youming Lu | Wenjie Yu | Zhihong Liu | C. B. Soh | M. Bhuiyan | S. Pannirselvam | Liu Wei | P. Somasuntharam | O. Somasuntharam