论文信息 - Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions - 字舞流文

Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions

Karen Maex | Denis Shamiryan | Serge Vanhaelemeersch | M. R. Baklanov | K. Maex | D. Shamiryan | M. Baklanov | S. Vanhaelemeersch | K. Weidner | W. D. Gray | K. Weidner

[1] K. Maex,et al. Controllable Change of Porosity of 3-Methylsilane Low-k Dielectric Film , 2001 .

[2] F. Dultsev,et al. Nondestructive Determination of Pore Size Distribution in Thin Films Deposited on Solid Substrates , 1999 .