论文信息 - HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth - 字舞流文

HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth

A. Hikavyy | K. Wostyn | B. Douhard | R. Loo | S. De Gendt | A. Moussa | P. Mertens | K. Kenis | F. Holsteyns | H. Profijt | S. Dhayalan | D. Rondas