Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
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Silicon can be etched in fluorine- and chlorine- containing plasmas in many ways. This article discusses some of the basic chemical and physical phenomena which play a role and more complicated interactions and side effects found in commercial process equipment.
[1] D. Flamm. WITHDRAWN: Introduction to Plasma Chemistry , 1989 .
[2] D. Flamm,et al. 1 – Plasma Etching Technology—An Overview , 1989 .