The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm
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Dominic Ashworth | Ken Goldberg | Rene Claus | Patrick Naulleau | Chris Anderson | Paul Denham | Gideon Jones | Ryan Miyakawa | Senajith Rekawa | Jason Stowers | Andrew Grenville | Hiroki Nakagawa | Ken Murayama | Lorie Mae Baclea-An | Suchit Bhattari | Rikos Chao
[1] Kenneth A. Goldberg,et al. The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch , 2011, Advanced Lithography.
[2] Kenneth A. Goldberg,et al. The SEMATECH Berkeley MET : extending EUV learning to 16-nm half pitch , 2011 .
[3] Kenneth A. Goldberg,et al. The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch , 2010, Advanced Lithography.