论文信息 - Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors - 字舞流文

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

J. Aarik | V. Sammelselg | H. Mändar | B. Hudec | L. Aarik | K. Fröhlich | K. Hušeková | R. Rammula | T. Arroval