Multiple-input single-output (MISO) ridge-optimizing quality controller for semiconductor manufacturing processes

This paper introduces an integrated run-to-run (R2R) multiple-input single-output control framework for semiconductor manufacturing processes. The controller, termed a ridge-optimizing quality controller (ROQC), can act as a recipe regulator between batches of silicon wafers during fabrication steps provided the equipment mechanism can be adequately represented by a quadratic polynomial of critical process factors, coupled with a dynamic process drifting that models equipment ageing. In each run, the process parameters in the underlying model are updated on-line using the recursive least squares method whenever the most recent controlled output is available, and subsequently a global optimization algorithm developed is employed to locate the optimum set-points inside the acceptability region of controllable factors for the execution of next run. The main components of ROQC are shown and its control performance is presented. Typical applications of R2R control to Chemical Mechanical Planarization in semico...

[1]  Arnon M. Hurwitz,et al.  Run-to-Run Process Control: Literature Review and Extensions , 1997 .

[2]  M. Zarrop,et al.  Convergence of a multi-input adaptive extremum controller , 1991 .

[3]  Rolf Isermann,et al.  Adaptive on-line steady-state optimization of slow dynamic processes , 1978, Autom..

[4]  T. M. Williams,et al.  Practical Methods of Optimization. Vol. 1: Unconstrained Optimization , 1980 .

[5]  D. Sorensen.  Newton's method with a model trust region modification , 1982 .

[6]  J. Si,et al.  Monitoring and control of semiconductor manufacturing processes , 1998 .

[7]  Enrique Del Castillo,et al.  Long run and transient analysis of a double EWMA feedback controller , 1999 .

[8]  Norman R. Draper,et al.  "RIDGE ANALYSIS" OF RESPONSE SURFACES , 1963 .

[9]  Armann Ingolfsson,et al.  Run by run process control: combining SPC and feedback control , 1995 .

[10]  G. Box,et al.  On the Experimental Attainment of Optimum Conditions , 1951 .

[11]  G. Stewart,et al.  Matrix Perturbation Theory , 1990 .

[12]  George E. P. Box,et al.  Discrete proportional-integral control with constrained adjustment , 1995 .

[13]  Shu-Kai S. Fan.  Quality improvement of chemical-mechanical wafer planarization process in semiconductor manufacturing using a combined generalized linear modelling - non-linear programming approach , 2000 .

[14]  Jinn-Yi Yeh,et al.  An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes , 1998, ICMTS 1998.

[15]  P. E. Wellstead,et al.  Self-tuning extremum control , 1990 .

[16]  G. Nanz,et al.  Modeling of chemical-mechanical polishing: a review , 1995 .

[17]  David M. author-Gay.  Computing Optimal Locally Constrained Steps , 1981 .

[18]  S. W. Butler,et al.  Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry , 1994 .

[19]  John F. MacGregor,et al.  A different view of the funnel experiment , 1990 .

[20]  G. Box,et al.  Some New Three Level Designs for the Study of Quantitative Variables , 1960 .

[21]  Gwilym M. Jenkins,et al.  Time series analysis, forecasting and control , 1971 .

[22]  Shu-Kai S. Fan,et al.  A different view of ridge analysis from numerical optimization , 2003 .

[23]  Edward A. Rietman,et al.  Modeling and control of a semiconductor manufacturing process with an automata network: An example in plasma etch processing , 1996, Comput. Oper. Res..

[24]  Armann Ingolfsson,et al.  Stability and Sensitivity of an EWMA Controller , 1993 .

[25]  N. Patel,et al.  Adaptive optimization of run-to-run controllers: the EWMA example , 2000 .

[26]  Douglas C. Montgomery,et al.  Response Surface Methodology: Process and Product Optimization Using Designed Experiments , 1995 .

[27]  R. Fletcher.  Practical Methods of Optimization , 1988 .

[28]  Duane S. Boning,et al.  DOE/Opt: a system for design of experiments, response surface modeling, and optimization using process and device simulation , 1994 .

[29]  B. Erik Ydstie,et al.  Adaptive extremum control using approximate process models , 1989 .

[30]  Thomas F. Edgar,et al.  Adaptive control strategies for process control: A survey , 1986 .

[31]  George E. P. Box,et al.  Statistical Control: By Monitoring and Feedback Adjustment , 1997 .

[32]  Björn Wittenmark,et al.  On Self Tuning Regulators , 1973 .

[33]  Sirish L. Shah,et al.  Recursive least squares based estimation schemes for self‐tuning control , 1991 .

[34]  Jorge J. Moré,et al.  Computing a Trust Region Step , 1983 .

[35]  Shu-Kai S. Fan,et al.  SISO run-to-run feedback controller using triple EWMA smoothing for semiconductor manufacturing processes , 2002 .