Dual Mode Patterning of Fluorine-Containing Block Copolymers through Combined Top-down and Bottom-up Lithography
暂无分享,去创建一个
[1] William F. Edmonds,et al. Synthesis and self‐assembly of highly incompatible polybutadiene–poly(hexafluoropropylene oxide) diblock copolymers , 2005 .
[2] Jongseung Yoon,et al. Enabling nanotechnology with self assembled block copolymer patterns , 2003 .
[3] T. Lodge,et al. Mapping Large Regions of Diblock Copolymer Phase Space by Selective Chemical Modification , 2004 .
[4] C. Ober,et al. Selective area control of self-assembled pattern architecture using a lithographically patternable block copolymer. , 2009, ACS nano.
[5] Joachim P. Spatz,et al. Micro‐Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron‐Beam Lithography , 2003 .
[6] Timothy P. Lodge,et al. Synthesis, Characterization, and Interaction Strengths of Difluorocarbene-Modified Polystyrene−Polyisoprene Block Copolymers , 2000 .
[7] F. Bates,et al. Conformationally asymmetric block copolymers , 1997 .
[8] E. Kramer,et al. Graphoepitaxy of Spherical Domain Block Copolymer Films , 2001 .
[9] S. Kutsumizu,et al. Dielectric relaxations of poly(fluoroalkyl methacrylates) and poly(fluoroalkyl .alpha.-fluoroacrylates) , 1992 .
[10] Soojin Park,et al. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order , 2009, Science.
[11] Joel K. W. Yang,et al. Complex self-assembled patterns using sparse commensurate templates with locally varying motifs. , 2010, Nature nanotechnology.
[12] A. Plettl,et al. A Combined Top–Down/Bottom–Up Approach to the Microscopic Localization of Metallic Nanodots , 2002 .
[13] C. Hawker,et al. Controlling Polymer-Surface Interactions with Random Copolymer Brushes , 1997, Science.
[14] T. Lodge,et al. Synthesis and self‐assembly of fluorinated block copolymers , 2002 .
[15] Soojin Park,et al. A simple top-down/bottom-up approach to sectored, ordered arrays of nanoscopic elements using block copolymers. , 2009, Small.
[16] K. Sugiyama,et al. Anionic Polymerizations of Perfluoroalkyl Methacrylates and Synthesis of Well-Defined ABC Triblock Copolymers of Methacrylates Containing Hydrophilic, Hydrophobic, and Perfluoroalkyl Groups , 1999 .
[17] C. Stafford,et al. Nanoscopic Templates from Oriented Block Copolymer Films , 2000 .
[18] T. Lodge,et al. Effect of Selective Perfluoroalkylation on the Segregation Strength of Polystyrene−1,2-Polybutadiene Block Copolymers , 2002 .
[19] Ting Xu,et al. The influence of molecular weight on nanoporous polymer films , 2001 .
[20] M. Hillmyer,et al. Templating Nanoporous Polymers with Ordered Block Copolymers , 2008 .
[21] J. Chien,et al. Radiolysis of resist polymers. III. Copolymers of methyl-α-chloroacrylate and trihaloethylmethacrylates , 1984 .
[22] C. Ober,et al. Spatially Controlled Fabrication of Nanoporous Block Copolymers , 2004 .
[23] R. Jerome,et al. Anionic polymerization of (meth)acrylic monomers. IV. Effect of lithium salts as ligands on the "living" polymerization of methyl methacrylate using monofunctional initiators , 1990 .
[24] Craig J Hawker,et al. Defect-free nanoporous thin films from ABC triblock copolymers. , 2006, Journal of the American Chemical Society.
[25] Erin M. Lennon,et al. Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays , 2008, Science.
[26] Ying Zhang,et al. Polymer self assembly in semiconductor microelectronics , 2006, 2006 International Electron Devices Meeting.
[27] Craig J Hawker,et al. A Generalized Approach to the Modification of Solid Surfaces , 2005, Science.
[28] Jae‐Suk Lee,et al. Polymerization of monomers containing functional silyl groups. 5. Synthesis of new porous membranes with functional groups , 1988 .
[29] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.
[30] B. Boutevin,et al. Control of free-radical polymerization of 2,2,2-trifluoroethyl methacrylate (TEMA) by a substituted fluorinated tetraphenylethane-type INITER , 2001 .
[31] T. Russell,et al. Nanofabrication of integrated magnetoelectronic devices using patterned self-assembled copolymer templates , 2002 .
[32] J. Helbert,et al. Synthesis and Radiation Degradation of Vinyl Polymers with Fluorine: Search for Improved Lithographic Resists, , 1980 .
[33] Ricardo Ruiz,et al. Control of self-assembly of lithographically patternable block copolymer films. , 2008, ACS nano.