Statistical Compact Modeling and Si Verification Methodology

As we scale down to sub-65nm technologies, transistors and interconnects no longer act as predictable elements, but start acting as statistical blocks due to static and dynamic variations. This invited paper first reviews some of the key variations that need to be considered for any statistical analysis. Also, details for implementing statistical models into compact modeling flow are discussed. Finally, the paper reviews one of the techniques used for generating and validating statistical models with the silicon data

[1]  Anantha Chandrakasan,et al.  Models of Process Variations in Device and Interconnect , 2001 .

[2]  S.-Y. Oh,et al.  Modeling of pattern-dependent on-chip interconnect geometry variation for deep-submicron process and design technology , 1997, International Electron Devices Meeting. IEDM Technical Digest.

[3]  Vivek De,et al.  Design and reliability challenges in nanometer technologies , 2004, Proceedings. 41st Design Automation Conference, 2004..

[4]  Duane S. Boning,et al.  Using a statistical metrology framework to identify systematic and random sources of die- and wafer-level ILD thickness variation in CMP processes , 1995, Proceedings of International Electron Devices Meeting.

[5]  R. Keyes,et al.  Scaling, small numbers and randomness in semiconductors , 1994, IEEE Circuits and Devices Magazine.

[6]  C. C. McAndrew,et al.  Understanding MOSFET mismatch for analog design , 2003 .

[7]  A. Asenov Random dopant induced threshold voltage lowering and fluctuations in sub-0.1 /spl mu/m MOSFET's: A 3-D "atomistic" simulation study , 1998 .

[8]  A. Orailoglu,et al.  Forward discrete probability propagation method for device performance characterization under process variations , 2005, Proceedings of the ASP-DAC 2005. Asia and South Pacific Design Automation Conference, 2005..

[9]  H. Wong,et al.  Three-dimensional "atomistic" simulation of discrete random dopant distribution effects in sub-0.1 /spl mu/m MOSFET's , 1993, Proceedings of IEEE International Electron Devices Meeting.

[10]  M. Valtonen,et al.  Statistical techniques for the computer-aided optimization of analog integrated circuit , 1996, IEEE Transactions on Circuits and Systems I: Fundamental Theory and Applications.

[11]  Sani R. Nassif,et al.  Models of process variations in device and interconnect , 2000 .