Spatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas
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M. Hori | M. Sekine | K. Takeda | H. Kondo | K. Ishikawa | Chishio Koshimizu | T. Yamaguchi | T. Kimura