Study on New Method for Generating Highly Charged Ions with Double Pulse Laser Ion Source

In this research, we plan to generate highly charged ions by using a laser that can achieve high repetition. This laser is Ytterbium (Yb) laser that can be driven at high power and high repetition. We validate the two methods. The first method is a high-intensity laser that is focused on the solid, which analyzes the valence of generated ions (Single shot method). The second method is a previously formed pre-plasma using a Q-switched laser followed by reheating the pre-plasma using high-intensity Yb laser (Double shot method). At present, we have developed high power Yb laser and pre-testing of the ion source using the Nd:YAG laser is required to perform the measurement test described above. These analyzes were performed on tantalum and carbon ions with a valence analysis of ‘Time of Flight’ method in the pre-test. Additionally, development of Yb laser have already achieved a laser energy of 70mJ. The next stage we will develop to generate for highly charged ions to further high power laser. (Maybe change judging on the context of the sentence) The next stage we plan to generate highly charged ions to further the high power laser.