Atomic layer deposition of CuCl nanoparticles

We report the growth of copper (I) chloride by atomic layer deposition. CuCl was deposited as nanoparticle arrays whose size and density were controlled by the process conditions. The nanoparticles were deposited using the self-limiting reaction of [bis(trimethylsilyl)acetylene]-(hexafluoroacetylacetonato)-copper(I) and hydrogen chloride. UV absorption measurements showed the characteristic Z1,2 and Z3 exciton absorption bands of CuCl. A strong UV emission was observed at 5 K from the free exciton Z3 and bound exciton I1 at 386.7 and 390.6 nm, respectively. A previously unreported visible emission band at 408 nm was also observed and attributed to the acceptor level of Cu vacancies.

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