Progress and Challenge in High to Ultra-High Voltage SiC Power Devices
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Y. Yonezawa1), T. Kimoto2), and H. Okumura1) 1) Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan 2) Department of Electronic Science & Engineering Kyoto University, A1-301 Katsura, Nishikyo, Kyoto 615-8510, Japan E-mail: yoshiyuki-yonezawa@aist.go.jp (corresponding author)
[1] J. Cooper,et al. Fundamentals of Silicon Carbide Technology: Growth, Characterization, Devices and Applications , 2014 .
[2] P. Cochat,et al. Et al , 2008, Archives de pediatrie : organe officiel de la Societe francaise de pediatrie.