论文信息 - Rapid thermal chemical vapor deposition of germanium on silicon and silicon dioxide and new applications of ge in ULSI technologies - 字舞流文

Rapid thermal chemical vapor deposition of germanium on silicon and silicon dioxide and new applications of ge in ULSI technologies

D. T. Grider | J. Wortman | P. Russell | D. Batchelor | M. Littlejohn | M. C. Öztürk | Y. Zhong