Thermomechanical Stresses in Copper Interconnect/Low-κ Dielectric Systems
暂无分享,去创建一个
[1] J. Cluzel,et al. Integration of copper with an organic low-k dielectric in 0.12-µm node interconnect , 2002 .
[2] Robert Rosenberg,et al. Electromigration path in Cu thin-film lines , 1999 .
[3] Subra Suresh,et al. Evolution of stresses in passivated and unpassivated metal interconnects , 1998 .
[4] Yu-Lin Shen,et al. Temperature-dependent inelastic response of passivated copper films: Experiments, analyses, and implications , 2003 .
[5] Y.-L. Shen,et al. Analysis of thermal stresses in metal interconnects with multilevel structures , 2002, Microelectron. Reliab..
[6] Yu-Lin Shen,et al. Thermomechanical response and stress analysis of copper interconnects , 2003 .
[7] Yu‐Lin Shen. MODELING OF THERMAL STRESSES IN METAL INTERCONNECTS : EFFECTS OF LINE ASPECT RATIO , 1997 .
[8] Christine S. Hau-Riege,et al. An introduction to Cu electromigration , 2004, Microelectron. Reliab..
[9] Wen-Jie Qi,et al. Thermomechanical property of diffusion barrier layer and its effect on the stress characteristics of copper submicron interconnect structures , 2002, Microelectron. Reliab..