Compact Modeling of Variability Effects in Nanoscale nand Flash Memories

This paper presents a thorough investigation of the main variability effects in nanoscale nand Flash memories, considering their impact on device operation by means of a statistical compact model for the memory array. The compact model allows the accurate simulation not only of the nand string current in read conditions, including parasitic capacitive couplings among neighboring cells, but also of cell program and erase. Changing the model parameters to account for their physical fluctuation in a Monte Carlo fashion, the impact of each variability source on the statistical dispersion of both neutral and programmed cell threshold voltage is obtained for state-of-the-art and next-generation technology nodes. The good agreement between modeling and experimental results and the low computational load make the proposed methodology a valid solution for the assessment of variability constraints on nand technology design.

[1]  A. Lacaita,et al.  First evidence for injection statistics accuracy limitations in NAND Flash constant-current Fowler-Nordheim programming , 2007, 2007 IEEE International Electron Devices Meeting.

[2]  Paolo Fantini,et al.  Impact of Neutral Threshold-Voltage Spread and Electron-Emission Statistics on Data Retention of Nanoscale nand Flash , 2010, IEEE Electron Device Letters.

[3]  L. Larcher,et al.  Modeling nand Flash Memories for IC Design , 2008, IEEE Electron Device Letters.

[4]  Subhash Saini,et al.  Hierarchical approach to "atomistic" 3-D MOSFET simulation , 1999, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[5]  C.M. Compagnoni,et al.  Analytical Model for the Electron-Injection Statistics During Programming of Nanoscale nand Flash Memories , 2008, IEEE Transactions on Electron Devices.

[6]  Andrea L. Lacaita,et al.  Modeling of SILC based on electron and hole tunneling. II. Steady-state , 2000 .

[7]  A. Visconti,et al.  Comprehensive Analysis of Random Telegraph Noise Instability and Its Scaling in Deca–Nanometer Flash Memories , 2009, IEEE Transactions on Electron Devices.

[8]  Andrea L. Lacaita,et al.  Modeling of SILC Based on Electron and Hole Tunneling — Part II : Steady-State , 2000 .

[9]  Andrew R. Brown,et al.  Simulation of intrinsic parameter fluctuations in decananometer and nanometer-scale MOSFETs , 2003 .

[10]  H. Belgal,et al.  Recovery Effects in the Distributed Cycling of Flash Memories , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.

[11]  A. Asenov,et al.  Quantitative Evaluation of Statistical Variability Sources in a 45-nm Technological Node LP N-MOSFET , 2008, IEEE Electron Device Letters.

[12]  A.L. Lacaita,et al.  Statistical Model for Random Telegraph Noise in Flash Memories , 2008, IEEE Transactions on Electron Devices.

[13]  Andrea L. Lacaita,et al.  Modeling of SILC based on electron and hole tunneling. I. Transient effects , 2000 .

[14]  A. Lacaita,et al.  Investigation of the threshold voltage instability after distributed cycling in nanoscale NAND Flash memory arrays , 2010, 2010 IEEE International Reliability Physics Symposium.

[15]  A. Visconti,et al.  Ultimate Accuracy for the nand Flash Program Algorithm Due to the Electron Injection Statistics , 2008, IEEE Transactions on Electron Devices.

[16]  M. Park,et al.  The Effect of Negative $V_{\rm TH}$ of nand Flash Memory Cells on Data Retention Characteristics , 2009, IEEE Electron Device Letters.

[17]  Andrea L. Lacaita,et al.  Modeling of SILC Based on Electron and Hole Tunneling — Part I : Transient Effects , 2000 .

[18]  Jungdal Choi,et al.  Effects of floating-gate interference on NAND flash memory cell operation , 2002 .

[19]  A. Visconti,et al.  Giant Random Telegraph Signals in Nanoscale Floating-Gate Devices , 2007, IEEE Electron Device Letters.

[20]  M. Schulz,et al.  Conductance modulation of submicrometer metal–oxide–semiconductor field‐effect transistors by single‐electron trapping , 1996 .

[21]  Tetsuo Endoh,et al.  Fast and accurate programming method for multi-level NAND EEPROMs , 1995, 1995 Symposium on VLSI Technology. Digest of Technical Papers.

[22]  Andrea L. Lacaita,et al.  Variability effects on the VT distribution of nanoscale NAND Flash memories , 2010, 2010 IEEE International Reliability Physics Symposium.

[23]  P. Kalavade,et al.  Flash EEPROM threshold instabilities due to charge trapping during program/erase cycling , 2004, IEEE Transactions on Device and Materials Reliability.