论文信息 - Formation of contacts to shallow junctions using titanium silicide with diffusion barriers - 字舞流文

Formation of contacts to shallow junctions using titanium silicide with diffusion barriers

C. Lin | I. Rusakova | W. Zagozdzon-wosik | D. Zhang | D. Marton | R. Bleiler | J. Li | S. Gooty | Z. Zhang | Zh Zhang