Experimental identification of thermal induced warpage in polymer-metal composite films
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Heng Li | Chunsheng Zhu | Le Luo | Gaowei Xu | L. Luo | Gaowei Xu | Chunsheng Zhu | Heng Li
[1] Young-Chang Joo,et al. Stress relaxation during isothermal annealing in electroplated Cu films , 2008 .
[2] Peter Gumbsch,et al. Discrete dislocation simulation of plastic deformation in metal thin films , 2004 .
[3] Frank Richter,et al. On the determination of film stress from substrate bending: STONEY´s formula and its limits , 2006 .
[4] Krishnaswami Srihari,et al. Effect of Design Parameters on Drop Test Performance of Wafer Level Chip Scale Packages , 2012 .
[5] Luo Le,et al. The effects of cure temperature history on the stability of polyimide films , 2013 .
[6] Srinivasa Rao Vempati,et al. Process and reliability assessment of 200μm-thin embedded wafer level packages (EMWLPs) , 2011, 2011 IEEE 61st Electronic Components and Technology Conference (ECTC).
[7] T. Clyne,et al. An analytical model for predicting residual stresses in progressively deposited coatings Part 2: Cylindrical geometry , 1997 .
[8] Eduard Arzt,et al. Quantitative analysis of strengthening mechanisms in thin Cu films: Effects of film thickness, grain size, and passivation , 1998 .
[9] A. Evans,et al. The thermomechanical integrity of thin films and multilayers , 1995 .
[10] Yu-Lin Shen,et al. Thermomechanical response and stress analysis of copper interconnects , 2003 .
[11] G. Stoney. The Tension of Metallic Films Deposited by Electrolysis , 1909 .
[12] Le Luo,et al. Influence of the Viscoelastic Properties of the Polyimide Dielectric Coating on the Wafer Warpage , 2014, Journal of Electronic Materials.
[13] L. Luo,et al. Optimal design toward enhancement of thermomechanical reliability of polyimide layers in a flip-chip-on-lead-frame dual flat no-leads package with copper pillar bumps , 2013 .
[14] Le Luo,et al. Stress evolution during thermal cycling of copper/polyimide layered structures , 2014 .
[15] Eduard Arzt,et al. Thermomechanical behavior of different texture components in Cu thin films , 2001 .
[16] Q. Han,et al. Design and optimization of thermo-mechanical reliability in wafer level packaging , 2010, Microelectron. Reliab..
[17] Sheng-Jye Hwang,et al. Warpage Prediction and Experiments of Fan-Out Waferlevel Package During Encapsulation Process , 2013, IEEE Transactions on Components, Packaging and Manufacturing Technology.
[18] Yi-Shao Lai,et al. Electromigration reliability of redistribution lines in wafer-level chip-scale packages , 2011, ECTC 2011.
[19] P. C. Cheng,et al. Inelastic deformation of polyimide-copper thin films , 1991 .
[20] Deniz S. Tezcan,et al. Wafer bow of substrate transfer process for GaNLED on Si 8 inch , 2012, 2012 IEEE 14th Electronics Packaging Technology Conference (EPTC).
[21] T. Kenny,et al. What is the Young's Modulus of Silicon? , 2010, Journal of Microelectromechanical Systems.
[22] Le Luo,et al. FEA study of the evolution of wafer warpage during reflow process in WLP , 2012 .
[23] L. B. Freund,et al. Kinetic model for dependence of thin film stress on growth rate, temperature, and microstructure , 2012 .
[24] Kookheon Char,et al. Residual Stress Evolution in Dielectric Thin Films Prepared from Poly(methylsilsesquioxane) Precursor , 2002 .
[25] Huajian Gao,et al. Constrained diffusional creep in UHV-produced copper thin films , 2001 .
[26] Suk-kyu Ryu,et al. Characterization of thermal stresses in through-silicon vias for three-dimensional interconnects by bending beam technique , 2012 .
[27] Yu-Lin Shen,et al. Constitutive response of passivated copper films to thermal cycling , 2003 .
[28] Franz Faupel,et al. Stress relaxation during thermal cycling in metal/polyimide layered films , 1988 .
[29] Marc Legros,et al. In-situ TEM straining experiments of Al films on polyimide using a novel FIB design for specimen preparation , 2006 .
[30] Weng Khuen Ho,et al. Estimation of wafer warpage profile during thermal processing in microlithography , 2005 .
[31] Young-Chang Joo,et al. Stress Relaxation during Isothermal Annealing at Elevated Temperatures in Electroplated Cu Films , 2003 .
[32] Heng Li,et al. A novel mechanical diced trench structure for warpage reduction in wafer level packaging process , 2015, Microelectron. Reliab..
[33] Oliver Kraft,et al. Cyclic deformation of polycrystalline Cu films , 2003 .
[34] M. D. Thouless,et al. Stress development and relaxation in copper films during thermal cycling , 1993 .
[35] Shefford P. Baker,et al. Bauschinger effect and anomalous thermomechanical deformation induced by oxygen in passivated thin Cu films on substrates , 2003 .
[36] Paul S. Ho,et al. Isothermal stress relaxation in electroplated Cu films. I. Mass transport measurements , 2005 .