Nanosecond and femtosecond excimer-laser ablation of oxide ceramics

The uv laser-ablation behavior of various oxide ceramics (Al2O3, MgO, ZrO2) has been studied using different wavelengths (248 nm, 308 nm) and pulse durations (30 ns, 500 fs). Time-resolved absorption measurements of the sample and the ablation plume during ablation were performed.Using sub-ps pulses the ablation threshold fluence is generally lower than for ns pulses; the ablation rate is higher in the whole investigated fluence range up to 20 J/cm2.The study of the morphology of the ablation structures and the results of the absorption experiments lead to the conclusion that different ablation mechanisms are involved. Using ns pulses “plasma mediated ablation” is dominating, whereas in the fs case the process is controlled by multi-photon absorption enabling microstructuring of the material.

[1]  D. C. Shaver,et al.  Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silica , 1989 .

[2]  D. Hesse,et al.  Gas assisted microstructuring of ceramic materials irradiated with excimer lasers , 1993, International Symposium on High Power Laser Systems and Applications.

[3]  Haim Lotem,et al.  Absolute two-photon absorption coefficients at 355 and 266 nm , 1978 .

[4]  Peter E. Dyer,et al.  Laser ablation studies of magnesium oxide , 1993 .

[5]  D. C. Hanna,et al.  Handbook of Laser Science and Technology , 1988 .

[6]  S. C. Langford,et al.  Interactions of wide band-gap single crystals with 248 nm excimer laser radiation. II: NaCl , 1993 .

[7]  F. Umemura,et al.  XeCl laser ablation of yttria stabilized zirconia , 1992 .

[8]  E. Hontzopoulos,et al.  Excimer laser surface treatment of bulk ceramics , 1991 .

[9]  Andrew C. Tam,et al.  Picosecond laser sputtering of sapphire at 266 nm , 1989 .

[10]  Sándor Szatmári,et al.  Simplified laser system for the generation of 60 fs pulses at 248 nm , 1988 .

[11]  Dieter Bäuerle,et al.  Laser-induced formation and surface processing of High-Temperature superconductors , 1989 .

[12]  Thomas E. Waterman,et al.  Handbook of thermophysical properties of solid materials , 1961 .

[13]  M. Allmen Laser-beam interactions with materials , 1987 .

[14]  B. Wolff-Rottke,et al.  Excimer laser micromachining , 1993 .

[15]  P. Simon,et al.  Intensity-dependent loss properties of window materials at 248 nm. , 1989, Optics letters.

[16]  R. Srinivasan,et al.  Ultraviolet Laser Ablation of Organic Polymer Films , 1989 .

[17]  Dieter Bäuerle,et al.  Femtosecond-excimer-laser patterning of YBa2Cu3O7 films , 1991 .

[18]  M. Stuke,et al.  Ablation of polytetrafluoroethylene (Teflon) with femtosecond UV excimer laser pulses , 1989 .

[19]  M. Hutchinson,et al.  Intensity-induced nonlinear effects in UV window materials , 1989 .

[20]  R. Dreyfus,et al.  Laser‐induced fluorescence studies of excimer laser ablation of Al2O3 , 1986 .

[21]  M. Geiger,et al.  Excimer laser processing of ceramics and fiber-reinforced polymers assisted by a diagnostic system , 1991 .

[22]  W. Heiland,et al.  Ultraviolet laser ablation of halides and oxides , 1992 .

[23]  Hans K. Toenshoff,et al.  Absorption behavior of ceramic materials irradiated with excimer lasers , 1991, Other Conferences.

[24]  Norman H. Tolk,et al.  Laser induced desorption of ions from insulators near the ablation threshold , 1993 .

[25]  P. Simon,et al.  Nanosecond and femtosecond excimer laser ablation of fused silica , 1992 .

[26]  Z. Wu,et al.  Non-destructive reading of laser-induced single-shot incubation in dielectric coatings , 1993 .

[27]  Sylvain Lazare,et al.  Ultraviolet Laser Photoablation of Polymers: A Review and Recent Results , 1989 .

[28]  M. Stuke,et al.  Femtosecond uv excimer laser ablation , 1987 .