Low-noise automated measurement system for low-frequency current fluctuations in thin-oxide silicon structures

A description is given of the design of an automated system for low-noise measurement of low-frequency current fluctuations in thin-oxide silicon devices. The aim of these measurements is to study the current tunneling through the oxide, and to investigate its correlation with the oxide breakdown. The dedicated system is realized by integrating a personal computer commercial acquisition board with custom high-sensibility low-noise preamplifiers.<<ETX>>