Gated and STI defined ESD diodes in advanced bulk FinFET technologies
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Guido Groeseneken | G. Hellings | D. Linten | A. Thean | M. Scholz | R. Boschke | A. Sibaja-Hernandez | S.-H Chen | J.-W Lee | M.-H Song | Y. See
[1] Donggun Park,et al. Characteristics of the full CMOS SRAM cell using body-tied TG MOSFETs (bulk FinFETs) , 2006, IEEE Transactions on Electron Devices.