Surface-enhanced Raman scattering from copper and zinc phthalocyanine complexes by silver and indium Island films

Les films metalliques a structure en ilot representent une technique performante en spectrometrie pour l'identification de couches tres minces et de monocouches

[1]  P. Slevin,et al.  The Hollow Cathode Discharge as a Spectrochemical Emission Source , 1975 .

[2]  T. Loving,et al.  Simultaneous analysis of an abnormal glow discharge by atomic absorption spectrometry and mass spectrometry , 1983 .

[3]  J. Coburn.  A System for Determining the Mass and Energy of Particles Incident on a Substrate in a Planar Diode Sputtering System , 1970 .

[4]  W. D. Westwood,et al.  Glow discharge sputtering , 1976 .

[5]  K. Laqua,et al.  Spektrochemische analysen mit einer glimmentladungslampe als lichtquelle—I: Elektrische eigenschaften, probenabbau und spektraler charakter , 1971 .

[6]  W. Harrison,et al.  Sputter-Atomization Studies with a Glow Discharge , 1978 .

[7]  D. S. Gough.  Direct analysis of metals and alloys by atomic absorption spectrometry , 1976 .

[8]  P. Boumans.  Sputtering in a glow discharge for spectrochemical analysis , 1972 .

[9]  W. Grimm.  Eine neue glimmentladungslampe für die optische emissionsspektralanalyse , 1968 .

[10]  R. Loutfy,et al.  Interaction of indium metal with phthalocyanine molecules: Luminescence enhancement , 1982 .

[11]  W. D. Davis,et al.  Ion Energies at the Cathode of a Glow Discharge , 1963 .

[12]  Martin Moskovits,et al.  Surface roughness and the enhanced intensity of Raman scattering by molecules adsorbed on metals , 1978 .

[13]  H. Caswell,et al.  Role of Hydrogen in the Sputtering of Nickel–Chromium Films , 1967 .

[14]  J. Coburn,et al.  Plasma Sources in Analytical Mass Spectrometry , 1981 .

[15]  S. Hayashi,et al.  Surface-enhanced Raman scattering from copper phthalocyanine thin films , 1984 .

[16]  A. Hor,et al.  Raman spectra of solid films 3—Mg, Cu and Zn phthalocyanine complexes† , 1984 .

[17]  R. Loutfy,et al.  Enhanced Raman scattering from molecular‐dye films on silver , 1982 .

[18]  T. Loving,et al.  Dual-pin cathode geometry for glow discharge mass spectrometry , 1983 .

[19]  H. F. Winters,et al.  Plasma etching—A discussion of mechanisms , 1979 .

[20]  J. McNally,et al.  A hollow cathode source applicable to spectrographic analysis for the halogens and gases. , 1947, Journal of the Optical Society of America.

[21]  H. Human,et al.  A study of the density of sputtered atoms in the plasma of the modified Grimm-type glow discharge source , 1981 .

[22]  J. Creighton.  Surface raman electromagnetic enhancement factors for molecules at the surface of small isolated metal spheres: The determination of adsorbate orientation from sers relative intensities , 1983 .

[23]  P. F. Knewstubb,et al.  Mass Spectrometry of Ions in Glow Discharges. II. Negative Glow in Rare Gases , 1962 .

[24]  W. Westwood,et al.  Cathode Dark‐Space Measurements and Deposition Rates of Tantalum in a Sputtering System , 1972 .

[25]  G. D. Scott,et al.  The Structure of Evaporated Metal Films and Their Optical Properties , 1950 .

[26]  W. Westwood,et al.  Analysis of sputtering discharge by optical and mass spectrometry. I. Platinum and tantalum sputtered in argon , 1973 .

[27]  H. Human,et al.  An investigation into the role of metastable argon atoms in the afterglow plasma of a low pressure discharge , 1982 .