论文信息 - Nanostructure Alignment for Hot Electron Interference/Diffraction Devices.

Nanostructure Alignment for Hot Electron Interference/Diffraction Devices.

An ultrafine fabrication technique for hot electron interference/diffraction devices was developed. The alignment of two nanostructures by e-beam direct writing before and after crystal growth was reported for the first time. The aligned structure consists of 70 nm pitch grating GaInAs/InP buried structure and 70 nm pitch stripe electrode of Cr/Au.

M. Suhara | Y. Miyamoto | K. Furuya | H. Hongo | J. Suzuki

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